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定向碳纳米管:物理、理念、制作与器件(影印版 英文)

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  • 大小:41.38 MB
  • 语言:中文版
  • 格式: PDF文档
  • 阅读软件: Adobe Reader
资源简介
定向碳纳米管:物理、理念、制作与器件(影印版 英文)
作者:(美)任志峰 主编
出版时间:2014年版
内容简介
  《定向碳纳米管:物理、理念、制作和器件》一书介绍了碳纳米管的物理学和制作及其在光学、电学、化学和生物技术领域的应用。聚焦各种碳纳米管的结构表征,基底上或复合物中垂直、平行定向碳纳米管的制作,定向碳纳米管的物理性质及其在场发射、光学天线、光导、太阳能电池、化学器件、生物器件等领域的应用。《定向碳纳米管:物理、理念、制作与器件》详细介绍了碳纳米管的主要制备途径,特别是广泛应用的PECVD生长技术,同时也阐述了该领域面临的主要限制和挑战。
目录
Introduction to Carbon
References
Carbon Nanotubes
2.1 History of Carbon Nanotubes
2.1.1 History Before 1991
2.1.2 History Since 1991
2.1.3 History of Aligned Carbon Nanotubes
2.2 Structures of Carbon Nanotubes
2.2.1 Graphite
2.2.2 Single—Walled Carbon Nanotubes
2.2.3 Double—Walled Carbon Nanotubes
2.2.4 Multi—Walled Carbon Nanotubes
2.2.5 Bamboo—Like Carbon Nanotubes
2.2.6 CNT Y—Junctions
2.2.7 Carbon Nanobuds
2.2.8 CNT Nanotorus and Micro—Rings
2.2.9 Carbon Microtubes
2.2.10 Amorphous Carbon Nanotubes
2.2.11 Coiled Carbon Nanotubes
2.2.12 Flattened Carbon Nanotubes
2.2.13 Other Carbon Nanomaterials
2.3 Physical Properties of Carbon Nanotubes
2.3.1 Anisotropic Mechanical Properties
2.3.2 Anisotropic Electrical Properties
2.3.3 Anisotropic Thermal Conductivity
2.3.4 Anisotropic Thermal Diffusivity
2.3.5 Anisotropic Seebeck Coefficient
2.3.6 Other Anisotropic Physical Properties
References
Growth Techniques of Carbon Nanotubes
3.1 Arc Discharge
3.2 Laser Ablation
3.3 Chemical Vapor Deposition
3.4 Hydrothermal Methods.
3.5 Flame Method
3.6 Disproportionation of Carbon Monoxide
3.7 Catalytic Pyrolysis of Hydrocarbons
3.8 Electrolysis
3.9 Solar Energy.
References
4 Chemical Vapor Deposition of Carbon Nanotubes
4.1 Thermal Chemical Vapor Deposition
4.1.1 Hot—Wall Chemical Vapor Deposition
4.1.2 Hot—Wire Chemical Vapor Deposition
4.1.3 Thermal Chemical Vapor Deposition Growth Mechanism of Carbon Nanotubes
4.1.4 Experimental Condition of Carbon Nanotube Array Growth
4.2 Plasma—Enhanced Chemical Vapor Deposition
4.2.1 Direct Current Plasma—Enhanced Chemical Vapor Deposition
4.2.2 Radio—Frequency Plasma—Enhanced Chemical Vapor Deposition
4.2.3 Microwave Plasma—Assisted Chemical Vapor Deposition
4.2.4 Plasma—Enhanced Chemical Vapor Deposition Growth Mechanism of Carbon Nanotube Alignment
4.2.5 Experimental Conditions of Plasma—Enhanced Chemical Vapor Deposition Growth
References
5 Physics of Direct Current Plasma—Enhanced Chemical Vapor Deposition
5.1 Equipment Setup and Growth Procedure
5.2 Substrate and Underlayer
5.3 Growth Temperature
5.4 Plasma Heating and Etching Effects
5.5 Plasma States
5.6 Catalyst Crystal Orientation
5.7 Electric Field Manipulation
5.8 DC—PECVD Growth Mechanism
5.8.1 First Stage: Randomly Entangled CNT Growth
Technologies to Achieve Carbon Nanotube Alignment
……
7 Measurement Techniques of Aligned Carbon Nanotubes
8 Properties and Applications of Aligned Carbon Nanotube Arrays
9 Potential Applications of Carbon Nanotube Arrays
Epilogue
Index
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